26.1% thin-film GaAs solar cell using epitaxial lift-off

The epitaxial lift-off technique can be used to separate a III–V solar cell structure from its underlying GaAs substrate. Processing a thin-film cell is somewhat different from a regular cell on substrate. In this work a number of critical issues, e.g., a low-temperature anneal front contact and the...

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Veröffentlicht in:Solar energy materials and solar cells 2009-09, Vol.93 (9), p.1488-1491
Hauptverfasser: Bauhuis, G.J., Mulder, P., Haverkamp, E.J., Huijben, J.C.C.M., Schermer, J.J.
Format: Artikel
Sprache:eng
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Zusammenfassung:The epitaxial lift-off technique can be used to separate a III–V solar cell structure from its underlying GaAs substrate. Processing a thin-film cell is somewhat different from a regular cell on substrate. In this work a number of critical issues, e.g., a low-temperature anneal front contact and the metal mirror on backside of the thin-film are optimized. Together with an improved active layer material quality, grid mask and anti-reflection coating this leads to thin-film cells as good as cells on a substrate, with record efficiencies for single junction GaAs solar cells of 26.1% for both cell types.
ISSN:0927-0248
1879-3398
DOI:10.1016/j.solmat.2009.03.027