Surface properties of differently prepared ultrananocrystalline diamond surfaces

Ultrananocrystalline diamond/amorphous carbon composite films have been deposited by microwave plasma chemical vapour deposition from 17% CH 4/N 2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O 3 exposure) to obtain hydrogen, oxygen, and fluorin...

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Veröffentlicht in:	Diamond and related materials 2009-05, Vol.18 (5), p.745-749
Hauptverfasser:	Kulisch, W., Popov, C., Gilliland, D., Ceccone, G., Sirghi, L., Ruiz, A., Rossi, F.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Ion and electron beam-assisted deposition ion plating Materials science Methods of deposition of films and coatings film growth and epitaxy PEG Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma-based ion implantation and deposition Solid-fluid interfaces Surface characterization Surface modification Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Ultrananocrystalline diamond Wetting
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