Surface properties of differently prepared ultrananocrystalline diamond surfaces

Ultrananocrystalline diamond/amorphous carbon composite films have been deposited by microwave plasma chemical vapour deposition from 17% CH 4/N 2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O 3 exposure) to obtain hydrogen, oxygen, and fluorin...

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Veröffentlicht in:Diamond and related materials 2009-05, Vol.18 (5), p.745-749
Hauptverfasser: Kulisch, W., Popov, C., Gilliland, D., Ceccone, G., Sirghi, L., Ruiz, A., Rossi, F.
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Sprache:eng
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Zusammenfassung:Ultrananocrystalline diamond/amorphous carbon composite films have been deposited by microwave plasma chemical vapour deposition from 17% CH 4/N 2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O 3 exposure) to obtain hydrogen, oxygen, and fluorine terminated surfaces, which then have been characterized with respect to their composition, roughness, wettability, and other properties. Among others, it will be shown that H- and F-terminated surfaces are very stable even if exposed for long time to air, while O-terminated ones are prone to contaminations. H- and O-termination can be patterned by applying the UV/O 3 treatment through a mask. Finally, it will be shown that a non-fouling poly(ethylene glycol) layer can be grafted directly on oxygen terminated surfaces by an atom transfer radical polymerization process using α-bromoisobutyryl bromide as an initiator.
ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2009.01.005