Surface properties of differently prepared ultrananocrystalline diamond surfaces
Ultrananocrystalline diamond/amorphous carbon composite films have been deposited by microwave plasma chemical vapour deposition from 17% CH 4/N 2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O 3 exposure) to obtain hydrogen, oxygen, and fluorin...
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| Veröffentlicht in: | Diamond and related materials 2009-05, Vol.18 (5), p.745-749 |
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| container_title | Diamond and related materials |
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| creator | Kulisch, W. Popov, C. Gilliland, D. Ceccone, G. Sirghi, L. Ruiz, A. Rossi, F. |
| description | Ultrananocrystalline diamond/amorphous carbon composite films have been deposited by microwave plasma chemical vapour deposition from 17% CH
4/N
2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O
3 exposure) to obtain hydrogen, oxygen, and fluorine terminated surfaces, which then have been characterized with respect to their composition, roughness, wettability, and other properties. Among others, it will be shown that H- and F-terminated surfaces are very stable even if exposed for long time to air, while O-terminated ones are prone to contaminations. H- and O-termination can be patterned by applying the UV/O
3 treatment through a mask. Finally, it will be shown that a non-fouling poly(ethylene glycol) layer can be grafted directly on oxygen terminated surfaces by an atom transfer radical polymerization process using α-bromoisobutyryl bromide as an initiator. |
| doi_str_mv | 10.1016/j.diamond.2009.01.005 |
| format | Article |
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4/N
2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O
3 exposure) to obtain hydrogen, oxygen, and fluorine terminated surfaces, which then have been characterized with respect to their composition, roughness, wettability, and other properties. Among others, it will be shown that H- and F-terminated surfaces are very stable even if exposed for long time to air, while O-terminated ones are prone to contaminations. H- and O-termination can be patterned by applying the UV/O
3 treatment through a mask. Finally, it will be shown that a non-fouling poly(ethylene glycol) layer can be grafted directly on oxygen terminated surfaces by an atom transfer radical polymerization process using α-bromoisobutyryl bromide as an initiator.</description><identifier>ISSN: 0925-9635</identifier><identifier>EISSN: 1879-0062</identifier><identifier>DOI: 10.1016/j.diamond.2009.01.005</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Ion and electron beam-assisted deposition; ion plating ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; PEG ; Physics ; Physics of gases, plasmas and electric discharges ; Physics of plasmas and electric discharges ; Plasma applications ; Plasma-based ion implantation and deposition ; Solid-fluid interfaces ; Surface characterization ; Surface modification ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Ultrananocrystalline diamond ; Wetting</subject><ispartof>Diamond and related materials, 2009-05, Vol.18 (5), p.745-749</ispartof><rights>2008 Elsevier B.V.</rights><rights>2009 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c370t-807fb3dae1dc3b7ab6cc39bb74864801daf6b80819186b2088236c04a54cb4d3</citedby><cites>FETCH-LOGICAL-c370t-807fb3dae1dc3b7ab6cc39bb74864801daf6b80819186b2088236c04a54cb4d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.diamond.2009.01.005$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,3548,23929,23930,25139,27923,27924,45994</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=21853739$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Kulisch, W.</creatorcontrib><creatorcontrib>Popov, C.</creatorcontrib><creatorcontrib>Gilliland, D.</creatorcontrib><creatorcontrib>Ceccone, G.</creatorcontrib><creatorcontrib>Sirghi, L.</creatorcontrib><creatorcontrib>Ruiz, A.</creatorcontrib><creatorcontrib>Rossi, F.</creatorcontrib><title>Surface properties of differently prepared ultrananocrystalline diamond surfaces</title><title>Diamond and related materials</title><description>Ultrananocrystalline diamond/amorphous carbon composite films have been deposited by microwave plasma chemical vapour deposition from 17% CH
4/N
2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O
3 exposure) to obtain hydrogen, oxygen, and fluorine terminated surfaces, which then have been characterized with respect to their composition, roughness, wettability, and other properties. Among others, it will be shown that H- and F-terminated surfaces are very stable even if exposed for long time to air, while O-terminated ones are prone to contaminations. H- and O-termination can be patterned by applying the UV/O
3 treatment through a mask. 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thin films and whiskers (structure and nonelectronic properties)</topic><topic>Ultrananocrystalline diamond</topic><topic>Wetting</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kulisch, W.</creatorcontrib><creatorcontrib>Popov, C.</creatorcontrib><creatorcontrib>Gilliland, D.</creatorcontrib><creatorcontrib>Ceccone, G.</creatorcontrib><creatorcontrib>Sirghi, L.</creatorcontrib><creatorcontrib>Ruiz, A.</creatorcontrib><creatorcontrib>Rossi, F.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Diamond and related materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kulisch, W.</au><au>Popov, C.</au><au>Gilliland, D.</au><au>Ceccone, G.</au><au>Sirghi, L.</au><au>Ruiz, A.</au><au>Rossi, F.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Surface properties of differently prepared ultrananocrystalline diamond surfaces</atitle><jtitle>Diamond and related materials</jtitle><date>2009-05-01</date><risdate>2009</risdate><volume>18</volume><issue>5</issue><spage>745</spage><epage>749</epage><pages>745-749</pages><issn>0925-9635</issn><eissn>1879-0062</eissn><abstract>Ultrananocrystalline diamond/amorphous carbon composite films have been deposited by microwave plasma chemical vapour deposition from 17% CH
4/N
2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O
3 exposure) to obtain hydrogen, oxygen, and fluorine terminated surfaces, which then have been characterized with respect to their composition, roughness, wettability, and other properties. Among others, it will be shown that H- and F-terminated surfaces are very stable even if exposed for long time to air, while O-terminated ones are prone to contaminations. H- and O-termination can be patterned by applying the UV/O
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| ispartof | Diamond and related materials, 2009-05, Vol.18 (5), p.745-749 |
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| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Ion and electron beam-assisted deposition ion plating Materials science Methods of deposition of films and coatings film growth and epitaxy PEG Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma-based ion implantation and deposition Solid-fluid interfaces Surface characterization Surface modification Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Ultrananocrystalline diamond Wetting |
| title | Surface properties of differently prepared ultrananocrystalline diamond surfaces |
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