APPLICATION OF CHROMATIC MONITORING AS A PLASMA DIAGNOSTIC TECHNIQUE

This paper describes the application of chromatic monitoring of both laboratory and industrial plasmas. The light emitted from the nitrogen plasma generated in the different plasma sources was measured with an imaging spectrograph. The emission spectra were reduced to data points representing the ch...

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Veröffentlicht in:	Materials and manufacturing processes 2001-06, Vol.16 (6), p.863-874
Hauptverfasser:	Pavlik, Jaroslav, Spatenka, Petr, Stryhal, Zdenek, Hrachova, Vera, Kanka, Adolf, Cap, Jiri, Zicha, Josef
Format:	Artikel
Sprache:	eng
Schlagworte:	Chromatic monitoring Optical emission spectroscopy (OES) Plasma plume produced by laser applications Processing plasma monitoring and diagnostic
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Zusammenfassung:	This paper describes the application of chromatic monitoring of both laboratory and industrial plasmas. The light emitted from the nitrogen plasma generated in the different plasma sources was measured with an imaging spectrograph. The emission spectra were reduced to data points representing the chromatic coordinates of these spectra. The data compression makes this method attractive for monitoring plasma parameter changes. The aim of this work was to test the possibility of application of chromatic monitoring for plasma processing.
ISSN:	1042-6914 1532-2475
DOI:	10.1081/AMP-100108705