Nano-engineering of magnesium hydride for hydrogen storage

The destabilization of magnesium hydride (MgH 2) by solid-state reaction with Si in a nanoscale under vacuum was studied. The nanostructured Si films were deposited on the nanocrystalline MgH 2/Mg composite substrate by the pulsed laser deposition (PLD). The cross-sectional transmission electron mic...

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Veröffentlicht in:Microelectronic engineering 2009-04, Vol.86 (4), p.889-891
Hauptverfasser: Bystrzycki, J., Płociński, T., Zieliński, W., Wiśniewski, Z., Polanski, M., Mróz, W., Bojar, Z., Kurzdłowski, K.J.
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Sprache:eng
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Zusammenfassung:The destabilization of magnesium hydride (MgH 2) by solid-state reaction with Si in a nanoscale under vacuum was studied. The nanostructured Si films were deposited on the nanocrystalline MgH 2/Mg composite substrate by the pulsed laser deposition (PLD). The cross-sectional transmission electron microscopy (TEM) shows that the metastable Mg 5Si 6 is the only intermetallic compound formed in the Si–Mg region during the deposition. The destabilization of MgH 2 by Si forming the Mg 2Si intermetallic compound was not observed in a nanoscale at 150 °C under vacuum.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2008.12.003