Influence of dopant concentration on the phase transition and ionic conductivity in BIHFVOX system
BIHFVOX, formulated as Bi 4Hf x V 2− x O 11−( x /2)− δ , is a new member of BIMEVOX family. The system with various dopant concentrations (0⩽ x⩽0.40) was prepared by the solid state reaction. The phase stability as a function of composition was investigated using FT–IR, X-ray powder diffraction, dif...
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Veröffentlicht in: | Physica. B, Condensed matter Condensed matter, 2009-07, Vol.404 (14), p.2072-2079 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | BIHFVOX, formulated as Bi
4Hf
x
V
2−
x
O
11−(
x
/2)−
δ
, is a new member of BIMEVOX family. The system with various dopant concentrations (0⩽
x⩽0.40) was prepared by the solid state reaction. The phase stability as a function of composition was investigated using FT–IR, X-ray powder diffraction, differential scanning calorimetry and conductivity measurements. For
x=0.05, the α-polymorph was noticed at room temperature with clear evidence for two successive transitions; α↔β↔γ at 436 and 561
°C, respectively. For relatively higher dopant concentrations, 0.15⩽
x⩽0.20, the β↔γ transition was clearly evident. The variation of unit cell parameters as a function of temperature for
x=0.20 exhibited a subtle change in
c parameter around 400
°C due to the vacancy ordering phenomenon which is associated with occurrence of such transition. However, the existence of order–disorder, γ′↔γ transition was clearly confirmed for
x⩾0.25. It was also noticed that the increased dopant concentration of highly sized and charged Hf
4+ ion has a significant role in collapsing the fully disordered tetragonal into orthorhombic β′-domain at higher temperatures. AC impedance spectroscopy showed that the ionic conductivity is principally due to the grain contribution as clearly evident in the increased short-range diffusibility of oxide ion vacancy in the grains with increasing temperature. The composition dependence of conductivity exhibited a maximum for
x=0.25 at lower temperatures. |
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ISSN: | 0921-4526 1873-2135 |
DOI: | 10.1016/j.physb.2009.03.044 |