Electron sources utilizing thin CsBr coatings

We present experimental results obtained in solid Cu targets coated with ∼18 nm thick CsBr films operating in a reflection mode. The results indicate a factor of 50X increase in quantum efficiency relative to uncoated Cu samples. The CsBr/Cu samples are very robust allowing brief exposures to air wi...

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Veröffentlicht in:	Microelectronic engineering 2009-04, Vol.86 (4), p.529-531
Hauptverfasser:	Maldonado, Juan R., Liu, Zhi, Dowell, D.H., Kirby, Robert E., Sun, Yun, Pianetta, Piero, Pease, Fabian
Format:	Artikel
Sprache:	eng
Schlagworte:	Alkali halides Applied sciences CsBr Electromagnetism electron and ion optics Electron sources Electronics Exact sciences and technology Free electron lasers Fundamental areas of phenomenology (including applications) Microelectronic fabrication (materials and surfaces technology) Multi electron beam tools Optoelectronic devices Photocathodes Physics Radiation by moving charges Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Zusammenfassung:	We present experimental results obtained in solid Cu targets coated with ∼18 nm thick CsBr films operating in a reflection mode. The results indicate a factor of 50X increase in quantum efficiency relative to uncoated Cu samples. The CsBr/Cu samples are very robust allowing brief exposures to air without a substantial decrease in quantum efficiency and lifetime. The results are very encouraging from the point of view of reliable high efficiency electron sources for lithography or other applications including free electron lasers.
ISSN:	0167-9317 1873-5568
DOI:	10.1016/j.mee.2008.11.063