Tin Displacement Plating on Copper Using Alginate Gel Particle

Tin displacement plating has been used for improvement of soldering adhesion. Conventional displacement plating methods need a masking process for pattern plating. In the present study, we developed a non masking displacement plating method by using an alginate gel particles. A 10×10−3 cm3 sodium al...

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Veröffentlicht in:Hyōmen gijutsu 2008, Vol.59(6), pp.415-415
Hauptverfasser: SHITANDA, Isao, KAWANO, Takehiko, ITAGAKI, Masayuki, WATANABE, Kunihiro
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Sprache:jpn
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Zusammenfassung:Tin displacement plating has been used for improvement of soldering adhesion. Conventional displacement plating methods need a masking process for pattern plating. In the present study, we developed a non masking displacement plating method by using an alginate gel particles. A 10×10−3 cm3 sodium alginate solution was dropped into an aqueous solution containing 5 wt% tin sulfate and 0.83 mol dm−3 thiourea by using a microsyringe. The spherical gel particles were prepared by crosslinking between alginate and Sn2+. The average diameter of the gel particles was about 2 mm. A copper sheet was used as a substrate. An alginate gel particle containing electrolytes was attached to the copper surface and left for 30 min at 25°C. A circular tin film formed on the copper substrate with high uniformity and a sharp edge line. The diameter and thickness of the tin film was about 450 μm and 0.4 μm respectively.
ISSN:0915-1869
1884-3409
DOI:10.4139/sfj.59.415