Preparation and magnetoresistance of thin CrO2 films
Highly textured chromium dioxide (CrO2) films have been deposited on Al2O3 single-crystal substrates by atmospheric pressure chemical vapor deposition method (CVD). X-ray diffraction patterns show that the CrO2 films are (1 0 0)-oriented on Al2O3 (0 0 1) substrates, and are (1 0 1)-oriented on Al2O3...
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Veröffentlicht in: | Journal of magnetism and magnetic materials 2008-10, Vol.320 (19), p.2356-2358 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Highly textured chromium dioxide (CrO2) films have been deposited on Al2O3 single-crystal substrates by atmospheric pressure chemical vapor deposition method (CVD). X-ray diffraction patterns show that the CrO2 films are (1 0 0)-oriented on Al2O3 (0 0 1) substrates, and are (1 0 1)-oriented on Al2O3 (0 1 2) substrates. Scanning electron microscopy images indicate that the (1 0 0)-oriented CrO2 films grown on Al2O3 (0 0 1) substrates have smoother surface and better qualities than that grown on Al2O3 (0 1 2) substrate. At room temperature, the magnetoresistance of the (1 0 0)- and (1 0 1)-oriented CrO2 films are nearly same, and both show a linear dependence on applied magnetic field. While at 80 K, the (1 0 1)-oriented CrO2 films show a much larger magnetoresistance compared with the (1 0 0)-oriented CrO2 films. The reasons are briefly discussed. |
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ISSN: | 0304-8853 |
DOI: | 10.1016/j.jmmm.2008.04.159 |