Low-temperature curing of aluminum-doped zinc oxide films assisted by ultraviolet exposure

In this study, aluminum-doped zinc oxide films were prepared by a sol–gel method, followed by thermal curing at 200–500 °C. Prior ultraviolet exposure resulted in the subsequent curing temperature required to produce films with obvious crystallinity being successfully lowered to 200 °C because of th...

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Veröffentlicht in:Scripta materialia 2008-09, Vol.59 (6), p.646-648
Hauptverfasser: Chang, Shou-Yi, Huang, Yi-Chung, Chu, Hsin-Hsu, Hsiao, Yian-Chi, Yang, Nai-Hao, Lin, Chia-Feng
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Sprache:eng
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Zusammenfassung:In this study, aluminum-doped zinc oxide films were prepared by a sol–gel method, followed by thermal curing at 200–500 °C. Prior ultraviolet exposure resulted in the subsequent curing temperature required to produce films with obvious crystallinity being successfully lowered to 200 °C because of the early dissociation of diethanolamine ligands in the gel precursor. The crystalline films were constructed of nanosized grains without a preferred orientation. The grain size increased from 9 to 19 nm with curing temperature.
ISSN:1359-6462
1872-8456
DOI:10.1016/j.scriptamat.2008.05.034