GISAXS Size Distribution Characterization of Cu Nanoparticles Embedded in silica

GISAXS Size Distribution Characterization of Cu Nanoparticles Embedded in silica

Cu nanoparticles embedded in high purity silica produced by deep ion implantation at 2 MeV and located around 0.8 mum underneath the surface were analyzed by GISAXS and TEM. Same results were obtained by both techniques, indicating that GISAXS is a reliable method for shape and size characterization...

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Hauptverfasser: Pena-Rodriguez, Ovidio, Rodriguez-Fernandez, Luis, Rodriguez-Iglesias, Vladimir, Kellermann, Guinther, Crespo-Sosa, Alejandro, Cheang-Wong, Juan Carlos, Arenas-Alatorre, Jesus, Oliver, Alicia
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:Cu nanoparticles embedded in high purity silica produced by deep ion implantation at 2 MeV and located around 0.8 mum underneath the surface were analyzed by GISAXS and TEM. Same results were obtained by both techniques, indicating that GISAXS is a reliable method for shape and size characterization of metallic nanoclusters underneath the surface of a silica matrix. The Cu nanoparticles presented a nearly-spherical shape with a mean radius around 3+/-1.2 nm.
ISSN:0094-243X
DOI:10.1063/1.3086216