Towards 2-10 nm electron-beam lithography : A quantitative approach

This paper deals with three important contributions to quantitative electron beam patterning in the 2-10 nm regime where typically minimal probe size is comparable to feature size. First, application of an advanced knife edge structure for accurate electron beam size measurements. Secondly, optimiza...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Microelectronic engineering 2008-05, Vol.85 (5-6), p.805-809
Hauptverfasser: SIDORKIN, V, VAN RUN, A, VAN LANGEN-SUURLING, A, GRIGORESCU, A, VAN DER DRIFT, E
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:This paper deals with three important contributions to quantitative electron beam patterning in the 2-10 nm regime where typically minimal probe size is comparable to feature size. First, application of an advanced knife edge structure for accurate electron beam size measurements. Secondly, optimization of exposure procedure for optimum beam focus settings. And thirdly, investigation of the broadening effect of secondary electrons (SE) on the exposure process in the resists. The combined results provide a quantitative picture of limiting factors for the achievement of ultimate resolution.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2008.01.024