The fabrication of silicon-based PZT microstructures using an aerosol deposition method

This paper presents a series of processes for fabricating lead-zirconate-titanate (PZT) microstructures on a silicon substrate. An aerosol deposition method was used to deposit PZT thick film at room temperature. The low temperature deposition enabled a special lift-off process for patterning thick PZT films using a THB-151N photoresist. The milling rate of THB-151N by PZT particles was found to be the same as the PZT deposition rate of 5 mum h-1. Using this patterning technique, complex configurations of PZT microstructures have been demonstrated. Suspended multi-layer PZT microstructures have also been realized in this work.