Schottky barrier heights of n/p-type erbium-silicided schottky diodes

The Schottky barrier heights for electrons and holes of erbium-silicided Schottky diodes were extracted from the current–voltage-temperature characteristics in reverse bias condition. The effective barrier heights increased with temperature. The highest effective barrier heights for electrons and ho...

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Veröffentlicht in:Microelectronic engineering 2008-05, Vol.85 (5-6), p.1395-1398
Hauptverfasser: Jun, Myungsim, Kim, Yarkyeon, Choi, Cheljong, Kim, Taeyoub, Oh, Soonyoung, Jang, Moongyu
Format: Artikel
Sprache:eng
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Zusammenfassung:The Schottky barrier heights for electrons and holes of erbium-silicided Schottky diodes were extracted from the current–voltage-temperature characteristics in reverse bias condition. The effective barrier heights increased with temperature. The highest effective barrier heights for electrons and holes were extracted to be 0.38eV and 0.67eV at the high temperatures, respectively. The effective barrier heights may be close to the temperature-independent barrier heights of erbium-silicided Schottky diodes since the sum of the two barrier heights for electrons and holes is close to the bandgap of silicon and the conduction mechanisms of carriers can be explained by the pure thermionic emission model at the high temperatures.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2007.12.019