Nitride photocatalyst to generate hydrogen gas from water

We propose a new nitride photocatalyst of an n‐n+‐GaN structure to increase H2 gas generation. This structure consists of a thin lightly‐doped n‐type layer on a heavily‐doped n+‐type layer to realize an optimized depletion layer for optical absorption and highly conductive region, respectively. An o...

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Veröffentlicht in:Physica status solidi. C 2008-05, Vol.5 (6), p.2349-2351
Hauptverfasser: Iwaki, Yasuhiro, Ono, Masato, Yamaguchi, Kazuki, Kusakabe, Kazuhide, Fujii, Katsushi, Ohkawa, Kazuhiro
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Sprache:eng
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Zusammenfassung:We propose a new nitride photocatalyst of an n‐n+‐GaN structure to increase H2 gas generation. This structure consists of a thin lightly‐doped n‐type layer on a heavily‐doped n+‐type layer to realize an optimized depletion layer for optical absorption and highly conductive region, respectively. An optimized n‐n+‐GaN structure could generate much more H2 gas rather than a single n‐GaN layer structure by about 1.4 times. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
ISSN:1862-6351
1610-1634
1610-1642
DOI:10.1002/pssc.200778536