Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces
The ionization of xenon Rydberg atoms excited to the lowest states in the n = 20 Stark manifold at Si(1 0 0) surfaces possessing a robust (∼10 Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhan...
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Veröffentlicht in: | Surface science 2008-04, Vol.602 (7), p.1306-1312 |
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creator | Neufeld, D.D. Dunham, H.R. Wethekam, S. Lancaster, J.C. Dunning, F.B. |
description | The ionization of xenon Rydberg atoms excited to the lowest states in the
n
=
20 Stark manifold at Si(1
0
0) surfaces possessing a robust (∼10
Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhanced tunneling due to the presence of localized stray fields at the surface associated with surface charging or with surface inhomogeneities. A simple model is presented to justify this assertion. |
doi_str_mv | 10.1016/j.susc.2007.12.042 |
format | Article |
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n
=
20 Stark manifold at Si(1
0
0) surfaces possessing a robust (∼10
Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhanced tunneling due to the presence of localized stray fields at the surface associated with surface charging or with surface inhomogeneities. A simple model is presented to justify this assertion.</description><identifier>ISSN: 0039-6028</identifier><identifier>EISSN: 1879-2758</identifier><identifier>DOI: 10.1016/j.susc.2007.12.042</identifier><identifier>CODEN: SUSCAS</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Field ionization ; Insulating surfaces ; Ion–solid interactions ; Physics ; Semiconducting surfaces ; Silicon ; Silicon oxides ; Single crystal surfaces ; Surface electronic phenomena</subject><ispartof>Surface science, 2008-04, Vol.602 (7), p.1306-1312</ispartof><rights>2008 Elsevier B.V.</rights><rights>2008 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c361t-d1962bfeb8c178ad5bcfe473f408ed5671144ece30147a694ed95443c2eb41123</citedby><cites>FETCH-LOGICAL-c361t-d1962bfeb8c178ad5bcfe473f408ed5671144ece30147a694ed95443c2eb41123</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.susc.2007.12.042$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,777,781,3537,27905,27906,45976</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=20245662$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Neufeld, D.D.</creatorcontrib><creatorcontrib>Dunham, H.R.</creatorcontrib><creatorcontrib>Wethekam, S.</creatorcontrib><creatorcontrib>Lancaster, J.C.</creatorcontrib><creatorcontrib>Dunning, F.B.</creatorcontrib><title>Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces</title><title>Surface science</title><description>The ionization of xenon Rydberg atoms excited to the lowest states in the
n
=
20 Stark manifold at Si(1
0
0) surfaces possessing a robust (∼10
Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhanced tunneling due to the presence of localized stray fields at the surface associated with surface charging or with surface inhomogeneities. A simple model is presented to justify this assertion.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Field ionization</subject><subject>Insulating surfaces</subject><subject>Ion–solid interactions</subject><subject>Physics</subject><subject>Semiconducting surfaces</subject><subject>Silicon</subject><subject>Silicon oxides</subject><subject>Single crystal surfaces</subject><subject>Surface electronic phenomena</subject><issn>0039-6028</issn><issn>1879-2758</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LxDAQhoMouK7-AU-9KHpozaTpF3hQFj8WFgQ_ziFNJpKl26xJK7v7621Z8egcZubwvu8wDyHnQBOgkN8sk9AHlTBKiwRYQjk7IBMoiypmRVYekgmlaRXnlJXH5CSEJR2KV9mE3M1da3eys66NnIk22A7L61bX6D8j2blVGHrkNlbbHerozV5BRCN6HYXeG6kwnJIjI5uAZ79zSj4eH95nz_Hi5Wk-u1_EKs2hizVUOasN1qWCopQ6q5VBXqSG0xJ1lhcAnKPClAIvZF5x1FXGeaoY1hyApVNyuc9de_fVY-jEygaFTSNbdH0QaUoLKAfHlLC9UHkXgkcj1t6upN8KoGKEJZZihCVGWAKYGGANpovfdBmUbIyXrbLhz8ko41mej7rbvQ6HV78tehGUxVahth5VJ7Sz_535ATWMfiU</recordid><startdate>20080401</startdate><enddate>20080401</enddate><creator>Neufeld, D.D.</creator><creator>Dunham, H.R.</creator><creator>Wethekam, S.</creator><creator>Lancaster, J.C.</creator><creator>Dunning, F.B.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20080401</creationdate><title>Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces</title><author>Neufeld, D.D. ; Dunham, H.R. ; Wethekam, S. ; Lancaster, J.C. ; Dunning, F.B.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c361t-d1962bfeb8c178ad5bcfe473f408ed5671144ece30147a694ed95443c2eb41123</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Field ionization</topic><topic>Insulating surfaces</topic><topic>Ion–solid interactions</topic><topic>Physics</topic><topic>Semiconducting surfaces</topic><topic>Silicon</topic><topic>Silicon oxides</topic><topic>Single crystal surfaces</topic><topic>Surface electronic phenomena</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Neufeld, D.D.</creatorcontrib><creatorcontrib>Dunham, H.R.</creatorcontrib><creatorcontrib>Wethekam, S.</creatorcontrib><creatorcontrib>Lancaster, J.C.</creatorcontrib><creatorcontrib>Dunning, F.B.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Neufeld, D.D.</au><au>Dunham, H.R.</au><au>Wethekam, S.</au><au>Lancaster, J.C.</au><au>Dunning, F.B.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces</atitle><jtitle>Surface science</jtitle><date>2008-04-01</date><risdate>2008</risdate><volume>602</volume><issue>7</issue><spage>1306</spage><epage>1312</epage><pages>1306-1312</pages><issn>0039-6028</issn><eissn>1879-2758</eissn><coden>SUSCAS</coden><abstract>The ionization of xenon Rydberg atoms excited to the lowest states in the
n
=
20 Stark manifold at Si(1
0
0) surfaces possessing a robust (∼10
Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhanced tunneling due to the presence of localized stray fields at the surface associated with surface charging or with surface inhomogeneities. A simple model is presented to justify this assertion.</abstract><cop>Lausanne</cop><cop>Amsterdam</cop><cop>New York, NY</cop><pub>Elsevier B.V</pub><doi>10.1016/j.susc.2007.12.042</doi><tpages>7</tpages></addata></record> |
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source | Elsevier ScienceDirect Journals |
subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Field ionization Insulating surfaces Ion–solid interactions Physics Semiconducting surfaces Silicon Silicon oxides Single crystal surfaces Surface electronic phenomena |
title | Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces |
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