Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces

The ionization of xenon Rydberg atoms excited to the lowest states in the n = 20 Stark manifold at Si(1 0 0) surfaces possessing a robust (∼10 Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhan...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Surface science 2008-04, Vol.602 (7), p.1306-1312
Hauptverfasser: Neufeld, D.D., Dunham, H.R., Wethekam, S., Lancaster, J.C., Dunning, F.B.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 1312
container_issue 7
container_start_page 1306
container_title Surface science
container_volume 602
creator Neufeld, D.D.
Dunham, H.R.
Wethekam, S.
Lancaster, J.C.
Dunning, F.B.
description The ionization of xenon Rydberg atoms excited to the lowest states in the n = 20 Stark manifold at Si(1 0 0) surfaces possessing a robust (∼10 Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhanced tunneling due to the presence of localized stray fields at the surface associated with surface charging or with surface inhomogeneities. A simple model is presented to justify this assertion.
doi_str_mv 10.1016/j.susc.2007.12.042
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_33071844</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0039602807012022</els_id><sourcerecordid>33071844</sourcerecordid><originalsourceid>FETCH-LOGICAL-c361t-d1962bfeb8c178ad5bcfe473f408ed5671144ece30147a694ed95443c2eb41123</originalsourceid><addsrcrecordid>eNp9kE1LxDAQhoMouK7-AU-9KHpozaTpF3hQFj8WFgQ_ziFNJpKl26xJK7v7621Z8egcZubwvu8wDyHnQBOgkN8sk9AHlTBKiwRYQjk7IBMoiypmRVYekgmlaRXnlJXH5CSEJR2KV9mE3M1da3eys66NnIk22A7L61bX6D8j2blVGHrkNlbbHerozV5BRCN6HYXeG6kwnJIjI5uAZ79zSj4eH95nz_Hi5Wk-u1_EKs2hizVUOasN1qWCopQ6q5VBXqSG0xJ1lhcAnKPClAIvZF5x1FXGeaoY1hyApVNyuc9de_fVY-jEygaFTSNbdH0QaUoLKAfHlLC9UHkXgkcj1t6upN8KoGKEJZZihCVGWAKYGGANpovfdBmUbIyXrbLhz8ko41mej7rbvQ6HV78tehGUxVahth5VJ7Sz_535ATWMfiU</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>33071844</pqid></control><display><type>article</type><title>Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces</title><source>Elsevier ScienceDirect Journals</source><creator>Neufeld, D.D. ; Dunham, H.R. ; Wethekam, S. ; Lancaster, J.C. ; Dunning, F.B.</creator><creatorcontrib>Neufeld, D.D. ; Dunham, H.R. ; Wethekam, S. ; Lancaster, J.C. ; Dunning, F.B.</creatorcontrib><description>The ionization of xenon Rydberg atoms excited to the lowest states in the n = 20 Stark manifold at Si(1 0 0) surfaces possessing a robust (∼10 Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhanced tunneling due to the presence of localized stray fields at the surface associated with surface charging or with surface inhomogeneities. A simple model is presented to justify this assertion.</description><identifier>ISSN: 0039-6028</identifier><identifier>EISSN: 1879-2758</identifier><identifier>DOI: 10.1016/j.susc.2007.12.042</identifier><identifier>CODEN: SUSCAS</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Field ionization ; Insulating surfaces ; Ion–solid interactions ; Physics ; Semiconducting surfaces ; Silicon ; Silicon oxides ; Single crystal surfaces ; Surface electronic phenomena</subject><ispartof>Surface science, 2008-04, Vol.602 (7), p.1306-1312</ispartof><rights>2008 Elsevier B.V.</rights><rights>2008 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c361t-d1962bfeb8c178ad5bcfe473f408ed5671144ece30147a694ed95443c2eb41123</citedby><cites>FETCH-LOGICAL-c361t-d1962bfeb8c178ad5bcfe473f408ed5671144ece30147a694ed95443c2eb41123</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.susc.2007.12.042$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,777,781,3537,27905,27906,45976</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=20245662$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Neufeld, D.D.</creatorcontrib><creatorcontrib>Dunham, H.R.</creatorcontrib><creatorcontrib>Wethekam, S.</creatorcontrib><creatorcontrib>Lancaster, J.C.</creatorcontrib><creatorcontrib>Dunning, F.B.</creatorcontrib><title>Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces</title><title>Surface science</title><description>The ionization of xenon Rydberg atoms excited to the lowest states in the n = 20 Stark manifold at Si(1 0 0) surfaces possessing a robust (∼10 Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhanced tunneling due to the presence of localized stray fields at the surface associated with surface charging or with surface inhomogeneities. A simple model is presented to justify this assertion.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Field ionization</subject><subject>Insulating surfaces</subject><subject>Ion–solid interactions</subject><subject>Physics</subject><subject>Semiconducting surfaces</subject><subject>Silicon</subject><subject>Silicon oxides</subject><subject>Single crystal surfaces</subject><subject>Surface electronic phenomena</subject><issn>0039-6028</issn><issn>1879-2758</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LxDAQhoMouK7-AU-9KHpozaTpF3hQFj8WFgQ_ziFNJpKl26xJK7v7621Z8egcZubwvu8wDyHnQBOgkN8sk9AHlTBKiwRYQjk7IBMoiypmRVYekgmlaRXnlJXH5CSEJR2KV9mE3M1da3eys66NnIk22A7L61bX6D8j2blVGHrkNlbbHerozV5BRCN6HYXeG6kwnJIjI5uAZ79zSj4eH95nz_Hi5Wk-u1_EKs2hizVUOasN1qWCopQ6q5VBXqSG0xJ1lhcAnKPClAIvZF5x1FXGeaoY1hyApVNyuc9de_fVY-jEygaFTSNbdH0QaUoLKAfHlLC9UHkXgkcj1t6upN8KoGKEJZZihCVGWAKYGGANpovfdBmUbIyXrbLhz8ko41mej7rbvQ6HV78tehGUxVahth5VJ7Sz_535ATWMfiU</recordid><startdate>20080401</startdate><enddate>20080401</enddate><creator>Neufeld, D.D.</creator><creator>Dunham, H.R.</creator><creator>Wethekam, S.</creator><creator>Lancaster, J.C.</creator><creator>Dunning, F.B.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20080401</creationdate><title>Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces</title><author>Neufeld, D.D. ; Dunham, H.R. ; Wethekam, S. ; Lancaster, J.C. ; Dunning, F.B.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c361t-d1962bfeb8c178ad5bcfe473f408ed5671144ece30147a694ed95443c2eb41123</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Field ionization</topic><topic>Insulating surfaces</topic><topic>Ion–solid interactions</topic><topic>Physics</topic><topic>Semiconducting surfaces</topic><topic>Silicon</topic><topic>Silicon oxides</topic><topic>Single crystal surfaces</topic><topic>Surface electronic phenomena</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Neufeld, D.D.</creatorcontrib><creatorcontrib>Dunham, H.R.</creatorcontrib><creatorcontrib>Wethekam, S.</creatorcontrib><creatorcontrib>Lancaster, J.C.</creatorcontrib><creatorcontrib>Dunning, F.B.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Neufeld, D.D.</au><au>Dunham, H.R.</au><au>Wethekam, S.</au><au>Lancaster, J.C.</au><au>Dunning, F.B.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces</atitle><jtitle>Surface science</jtitle><date>2008-04-01</date><risdate>2008</risdate><volume>602</volume><issue>7</issue><spage>1306</spage><epage>1312</epage><pages>1306-1312</pages><issn>0039-6028</issn><eissn>1879-2758</eissn><coden>SUSCAS</coden><abstract>The ionization of xenon Rydberg atoms excited to the lowest states in the n = 20 Stark manifold at Si(1 0 0) surfaces possessing a robust (∼10 Å) native oxide layer is investigated. The data show that a sizeable fraction of the incident atoms are ionized relatively far from the surface through enhanced tunneling due to the presence of localized stray fields at the surface associated with surface charging or with surface inhomogeneities. A simple model is presented to justify this assertion.</abstract><cop>Lausanne</cop><cop>Amsterdam</cop><cop>New York, NY</cop><pub>Elsevier B.V</pub><doi>10.1016/j.susc.2007.12.042</doi><tpages>7</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0039-6028
ispartof Surface science, 2008-04, Vol.602 (7), p.1306-1312
issn 0039-6028
1879-2758
language eng
recordid cdi_proquest_miscellaneous_33071844
source Elsevier ScienceDirect Journals
subjects Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Field ionization
Insulating surfaces
Ion–solid interactions
Physics
Semiconducting surfaces
Silicon
Silicon oxides
Single crystal surfaces
Surface electronic phenomena
title Ionization of xenon Rydberg atoms at oxidized Si(1 0 0) surfaces
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T06%3A24%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Ionization%20of%20xenon%20Rydberg%20atoms%20at%20oxidized%20Si(1%200%200)%20surfaces&rft.jtitle=Surface%20science&rft.au=Neufeld,%20D.D.&rft.date=2008-04-01&rft.volume=602&rft.issue=7&rft.spage=1306&rft.epage=1312&rft.pages=1306-1312&rft.issn=0039-6028&rft.eissn=1879-2758&rft.coden=SUSCAS&rft_id=info:doi/10.1016/j.susc.2007.12.042&rft_dat=%3Cproquest_cross%3E33071844%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=33071844&rft_id=info:pmid/&rft_els_id=S0039602807012022&rfr_iscdi=true