Fabrication of ultra high aspect ratio Bragg gratings for optical filter

Fabrication of ultra high aspect ratio Bragg gratings for optical filter

In this paper a novel process for fabrication of high finesse and large spectral range integrated optics filtering structure for optical communication applications is presented. The technology approach used in the fabrication make use of glass-on-silicon substrates and comprise deep submicron ultra-...

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Veröffentlicht in:Microelectronic engineering 2008-07, Vol.85 (7), p.1511-1513
Hauptverfasser: Sardo, Stefano, Giacometti, Fabrizio, Doneda, Sergio, Colombo, Umberto, Crippa, Davide, Muri, Melissa Di, Fiorino, Antonio, Garnier, Audrey, Morson, Romano, Nottola, Alessandro, Zuliani, Giorgio, Gentili, Massimo, Romagnoli, Marco
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Bragg gratings
Circuit properties
Deep etching
E-beam
Electric, optical and optoelectronic circuits
Electronics
Exact sciences and technology
High aspect ratio
Integrated optics. Optical fibers and wave guides
Optical and optoelectronic circuits
Tri-layer mask
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Beschreibung
Zusammenfassung:In this paper a novel process for fabrication of high finesse and large spectral range integrated optics filtering structure for optical communication applications is presented. The technology approach used in the fabrication make use of glass-on-silicon substrates and comprise deep submicron ultra-high aspect ratio Bragg gratings which are deeply buried into the waveguide glass materials.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2008.02.010