Preparation of Epitaxial LiNbO3 Thin Film by MOCVD and its Properties
Lithium niobate (LiNbO3) thin films were deposited on Al2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichio...
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| Veröffentlicht in: | Key engineering materials 2009-01, Vol.388, p.179-182 |
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| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | Lithium niobate (LiNbO3) thin films were deposited on Al2O3(001) substrates using metal-organic
chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the
conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with
stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the
stoichiometric LiNbO3 thin film was 2.24 at = 632.8 nm, which is close to that of bulk crystal. |
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| ISSN: | 1013-9826 1662-9795 1662-9795 |
| DOI: | 10.4028/www.scientific.net/KEM.388.179 |