Three-dimensional phototransistors in 3D silicon-on-insulator technology
Measurement results of phototransistors designed in a three-dimensional (3D) 0.18mum silicon-on-insulator technology are presented. The phototransistors respond to light intensities of 5-200000lux with currents from 50fA to 2.3muA. The novelty of this phototransistor is that its photocurrent is prop...
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Veröffentlicht in: | Electronics letters 2007-03, Vol.43 (7), p.418-420 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Measurement results of phototransistors designed in a three-dimensional (3D) 0.18mum silicon-on-insulator technology are presented. The phototransistors respond to light intensities of 5-200000lux with currents from 50fA to 2.3muA. The novelty of this phototransistor is that its photocurrent is proportional to the square of the incident light intensity. The device measurements reported show that the photodetectors can be used for the design of high-density imaging arrays in three-dimensional SOI CMOS fabrication processes. |
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ISSN: | 0013-5194 1350-911X |
DOI: | 10.1049/el:20073502 |