An Efficient Route to Mesoporous Silica Films with Perpendicular Nanochannels

An Efficient Route to Mesoporous Silica Films with Perpendicular Nanochannels

Mesoporous silica films with cylindrical pores oriented normal to the substrate are prepared by selective deposition of silica within the poly(hydroxy styrene) domains of poly(α‐methyl styrene‐b‐ hydroxy styrene) template films using supercritical carbon dioxide as a delivery medium. Atomic force mi...

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Veröffentlicht in:Advanced materials (Weinheim) 2008-01, Vol.20 (2), p.246-251
Hauptverfasser: Nagarajan, S., Li, M., Pai, R. A., Bosworth, J. K., Busch, P., Smilgies, D.-M., Ober, C. K., Russell, T. P., Watkins, J. J.
Format: Artikel
Sprache:eng
Schlagworte:
Block copolymers
Mesoporous materials
Nanostructured materials
Porous materials
Silica
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Zusammenfassung:Mesoporous silica films with cylindrical pores oriented normal to the substrate are prepared by selective deposition of silica within the poly(hydroxy styrene) domains of poly(α‐methyl styrene‐b‐ hydroxy styrene) template films using supercritical carbon dioxide as a delivery medium. Atomic force microscopy, electron microscopy, and grazing incidence small angle X‐ray scattering (see figure) studies confirm the vertical alignment of the cylindrical pores.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200701766