Crystallization of thin amorphous TiB2 films when heated in electron diffraction column

Crystallization of thin amorphous TiB2 films when heated in electron diffraction column

The change in the structure of amorphous TiB^sub 2^ thin films 40 nm thick in heating in an electron diffraction column is studied. Amorphous films are produced by magnetron sputtering a titanium diboride target prepared by powder metallurgy method in argon. It is determined that crystal borides (fr...

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Veröffentlicht in:Powder metallurgy and metal ceramics 2007-09, Vol.46 (9-10), p.499-502
Hauptverfasser: Dranenko, A S, Dvorina, L A
Format: Artikel
Sprache:eng
Schlagworte:
Crystallization
Powder metallurgy
R&D
Research & development
Thin films
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Zusammenfassung:The change in the structure of amorphous TiB^sub 2^ thin films 40 nm thick in heating in an electron diffraction column is studied. Amorphous films are produced by magnetron sputtering a titanium diboride target prepared by powder metallurgy method in argon. It is determined that crystal borides (from lower to higher) appear with increasing heating temperature. The correlation is established between the crystallization temperature and Ti-B bonding energy.[PUBLICATION ABSTRACT]
ISSN:1068-1302
1573-9066
DOI:10.1007/s11106-007-0077-6