CMOS 2D Hall microsensor with minimal design complexity

A new silicon integrated 2D Hall sensor for high-accuracy magnetic-field in-plane vector measurements fabricated through a CMOS technology, has been suggested and tested. Its unique advantage is minimal design complexity: only four external connections, lack of cross-sensitivity between the channels...

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Veröffentlicht in:Electronics letters 2007-04, Vol.43 (9), p.511-513
Hauptverfasser: ROUMENIN, Ch. S, LOZANOVA, S. V
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LOZANOVA, S. V
description A new silicon integrated 2D Hall sensor for high-accuracy magnetic-field in-plane vector measurements fabricated through a CMOS technology, has been suggested and tested. Its unique advantage is minimal design complexity: only four external connections, lack of cross-sensitivity between the channels and very high resolution. In addition, a simple, but highly effective circuitry fully compensates for the offsets and the nonlinear magnetoresistance of the two outputs.
doi_str_mv 10.1049/el:20070784
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subjects Applied sciences
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
title CMOS 2D Hall microsensor with minimal design complexity
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