CMOS-compatible optical rib waveguides defined by local oxidation of silicon

The local oxidation of silicon process is shown to be an effective means of defining optical rib waveguides in silicon on insulator while maintaining the surface planarity required for CMOS integration. Experimental waveguides have shown singlemode operation and losses of less than 1dB/cm in the tel...

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Veröffentlicht in:	Electronics letters 2007-03, Vol.43 (7), p.392-393
Hauptverfasser:	ROWE, L. K, ELSEY, M, TARR, N. G, KNIGHTS, A. P, POST, E
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Circuit properties Design. Technologies. Operation analysis. Testing Electric, optical and optoelectronic circuits Electronics Exact sciences and technology Integrated circuits Integrated optics. Optical fibers and wave guides Optical and optoelectronic circuits Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Zusammenfassung:	The local oxidation of silicon process is shown to be an effective means of defining optical rib waveguides in silicon on insulator while maintaining the surface planarity required for CMOS integration. Experimental waveguides have shown singlemode operation and losses of less than 1dB/cm in the telecommunications band around 1550nm.
ISSN:	0013-5194 1350-911X
DOI:	10.1049/el:20073680