Atomic-Scale Friction and Adhesion at Ambient Pressure

In this Perspective, we present the recent advancement and the prospects of atomic-scale friction and adhesion measurements across the pressure gap between ultrahigh vacuum and ambient pressure environments using variable-pressure atomic force microscopy (VP-AFM). We introduce the VP-AFM that enable...

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Veröffentlicht in:Langmuir 2024-10, Vol.40 (41), p.21317-21326
Hauptverfasser: Choi, Joong Il Jake, Cho, Hunyoung, Park, Jeong Young
Format: Artikel
Sprache:eng
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Zusammenfassung:In this Perspective, we present the recent advancement and the prospects of atomic-scale friction and adhesion measurements across the pressure gap between ultrahigh vacuum and ambient pressure environments using variable-pressure atomic force microscopy (VP-AFM). We introduce the VP-AFM that enables nanotribological studies under various gas conditions with partial pressure ranging from UHV (1.0 × 10–10 mbar) to 1 bar. We highlight the frictional behaviors of ultrananocrystalline diamond surface in oxygen and water gas environments, as well as the chemical states probed with near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS). The atomic scale degradation processes of MA­(CH3NH3)­PbBr3, which is an organic–inorganic hybrid perovskite (OHP) investigated with VP-AFM are introduced. Finally, we discuss the potential works on catalytic model systems including bimetallic Pt3Ni­(111) and TiO2(110) and the future perspective of nanotribology under ambient conditions.
ISSN:0743-7463
1520-5827
1520-5827
DOI:10.1021/acs.langmuir.4c01146