Presence of pesticide-tolerant microorganisms in high-altitude pristine lakes within Singalila Ridge of the Himalayas
This is the first report on high pesticide tolerance displayed by the microbiota isolated from the sediments of two high-altitude lakes, located in the Singalila National Park, Singalila Ridge of the Himalayas. Given the remote location of these lakes, direct exposure to chemical pesticides is highl...
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Veröffentlicht in: | Environmental monitoring and assessment 2024-10, Vol.196 (10), p.925-925, Article 925 |
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Sprache: | eng |
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Zusammenfassung: | This is the first report on high pesticide tolerance displayed by the microbiota isolated from the sediments of two high-altitude lakes, located in the Singalila National Park, Singalila Ridge of the Himalayas. Given the remote location of these lakes, direct exposure to chemical pesticides is highly unlikely. However, the high tolerance to commonly used pesticides exhibited, i.e. up to 250 mg/ml, suggests repeated exposure and contamination of the lakes. Microbial growth in the presence of varying concentrations of the pesticides, namely, emamectin benzoate, thiamethoxam, quinalphos, deltamethrin, spiromesifen, flubendiamide, monocrotophos, fipronil, fenazaquin and phorate, was tested. Results showed resistance to all pesticides except fenazaquin and fipronil, up to 250 mg/ml. For the latter two, tolerance was displayed up to a concentration of 40 mg/ml. Tolerance may potentially result from the transport and deposition of pesticides from nearby locations, particularly the tea plantations of Darjeeling and Eastern Nepal. This may create great ecological risks as these lakes are an important water source for endemic wildlife of this protected area. They also hold great significance to the religious sentiment of the local tribes who worship these lakes as sacred. The study highlights the need for monitoring pesticide contamination in such pristine high-altitude environments and the mechanisms of long-range pollutant transport. |
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ISSN: | 0167-6369 1573-2959 1573-2959 |
DOI: | 10.1007/s10661-024-13097-w |