Synthesis and Structural Modulation of Nanoporous Copper Films by Magnetron Sputtering and One-Step Dealloying

Nanoporous copper (np-Cu) has attracted much more attention due to its lower cost compared to other noble metals and high functionality in practical use. Herein, Al Cu (x = 13-88 at.%) precursor films with thicknesses of 0.16-1.1 μm were fabricated by varying magnetron co-sputtering parameters. Subsequently, utilizing a one-step dealloying strategy, a series of np-Cu films with ligament sizes ranging from 11.4-19.0 nm were synthesized. The effects of precursor composition and substrate temperature on the microstructure of np-Cu films were investigated. As the atomic ratio of Cu increases from 15 to 34, the np-Cu film detached from the substrate gradually transforms into a bi-continuous ligament-channel structure that is well bonded to the substrate. Furthermore, the novel bi-layer hierarchical np-Cu films were successfully prepared based on single-layer nanoporous films. Our findings not only contribute to the systematic understanding of the modification of the morphology and structure of np-Cu films but also offer a valuable framework for the design and fabrication of other non-noble nanoporous metals with tailored properties.