What could be the low-temperature limit of atomic layer deposition of platinum using MeCpPtMe3 and oxygen?

What could be the low-temperature limit of atomic layer deposition of platinum using MeCpPtMe3 and oxygen?

We explore the low-temperature limit of atomic layer deposition of Pt using MeCpPtMe3 and O2. We reveal that by supplying a sufficiently high O2 exposure, highly dispersed and thermally stable Pt sub-nanometer clusters can be deposited onto the surface of P25 TiO2 nanoparticles even at room temperat...

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Veröffentlicht in:Chemical communications (Cambridge, England) England), 2024-11, Vol.60 (95), p.14045-14048
Hauptverfasser: Hao Van Bui, Anh Phan Nguyen, Dang, Manh Duc, Truong, Duc Dinh, Kooyman, Patricia J, J Ruud Van Ommen
Format: Artikel
Sprache:eng
Schlagworte:
Atomic layer epitaxy
Low temperature
Platinum
Room temperature
Thermal stability
Titanium dioxide
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Zusammenfassung:We explore the low-temperature limit of atomic layer deposition of Pt using MeCpPtMe3 and O2. We reveal that by supplying a sufficiently high O2 exposure, highly dispersed and thermally stable Pt sub-nanometer clusters can be deposited onto the surface of P25 TiO2 nanoparticles even at room temperature by atmospheric-pressure ALD.
ISSN:1359-7345
1364-548X
1364-548X
DOI:10.1039/d4cc04679j