Hole-Mask Colloidal Lithography

Hole-Mask Colloidal Lithography

Hole‐mask colloidal lithography (HCL) represents a truly versatile and simple bottom‐up nanofabrication method based on colloidal self‐assembly lithographic patterning. The HCL technique provides an effective means of patterning vast surface areas with diverse functional nanoarchitectures. Examples...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Weinheim) 2007-12, Vol.19 (23), p.4297-4302
Hauptverfasser: Fredriksson, H., Alaverdyan, Y., Dmitriev, A., Langhammer, C., Sutherland, D. S., Zäch, M., Kasemo, B.
Format: Artikel
Sprache:eng
Schlagworte:
Lithography
Nanofabrication
Self-assembly
Surface patterning
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Hole‐mask colloidal lithography (HCL) represents a truly versatile and simple bottom‐up nanofabrication method based on colloidal self‐assembly lithographic patterning. The HCL technique provides an effective means of patterning vast surface areas with diverse functional nanoarchitectures. Examples include arrays of nanodiscs, oriented elliptical nanostructures, (binary) nanodisc pairs, nanocones on extended surfaces and nanodiscs embedded in a surrounding matrix.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200700680