Spatial Forcing of Self-Organized Microwrinkles by Periodic Nanopatterns

Spatial Forcing of Self-Organized Microwrinkles by Periodic Nanopatterns

Spatially forced self‐organized microwrinkles using a substrate with periodic nanopatterns are fabricated by nanolithography. The hard (metal, organic or inorganic/organic) film formed on the patterned substrate forms precisely directed wrinkles under lateral compression. The wavelength is resonantl...

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Veröffentlicht in:Advanced materials (Weinheim) 2007-10, Vol.19 (20), p.3229-3232
Hauptverfasser: Ohzono, T., Watanabe, H., Vendamme, R., Kamaga, C., Kunitake, T., Ishihara, T., Shimomura, M.
Format: Artikel
Sprache:eng
Schlagworte:
Lithography
Microstructures
Soft lithograpy
Surface patterning
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Zusammenfassung:Spatially forced self‐organized microwrinkles using a substrate with periodic nanopatterns are fabricated by nanolithography. The hard (metal, organic or inorganic/organic) film formed on the patterned substrate forms precisely directed wrinkles under lateral compression. The wavelength is resonantly forced to the integral multiples of the periodicity of nanopatterns.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200700618