Low temperature RTP for BCB curing

Rapid thermal processing (RTP) applications are rapidly expanding from the original processes, typically performed above 1000 °C (e.g., post-implant annealing and silicon oxidation) to lower temperature applications such as cobalt and nickel silicide formation with process steps performed as low as...

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Bibliographische Detailangaben

Veröffentlicht in:	Microelectronic engineering 2007-11, Vol.84 (11), p.2646-2652
Hauptverfasser:	Ouaknine, Michel, Malik, Igor J., Odera, Masato, Ishigaki, Toshikazu, Ueda, Takeshi, Fukada, Takashi, Yoo, Woo Sik, Soussan, Philippe, Muller, Philippe
Format:	Artikel
Sprache:	eng
Schlagworte:	BCB curing BPSG Exact sciences and technology Fundamental areas of phenomenology (including applications) Hot wall chamber Isothermal cavity Low temperature thermal processing Optical sources and standards Optics Physics RTP, rapid thermal processing SOD anneal
Online-Zugang:	Volltext
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