Growth of cubic SiC single crystals by the physical vapor transport technique

Suitable process parameters for the growth of cubic 3C-SiC single crystals via the seeded physical vapor transport (PVT) technique, also known as the modified Lely method, have been determined. Free-standing, 200 μm thick 3C-SiC epilayers with (0 0 1)- or (0 0 1¯)-face grown on undulant Si (0 0 1) as well as 3C-SiC platelets with [1 1 1]- or [1¯ 1¯ 1¯]-orientation grown by thermal decomposition of methyl trichlorosilane in hydrogen were employed as seed crystals. The source material consisted of stoichiometric SiC; in addition, a separate Si source was deposited in the furnace at a temperature of about 1500 °C. The temperature of the seed crystals was kept at about 1900 °C. Stable growth of 3C-SiC bulk material of high crystalline quality was reached on 3C-SiC seed crystals with (0 0 1)-face providing a low density of planar defects and at near-thermal-equilibrium conditions resulting in a reduction of internal stress and as a consequence in avoiding the generation of new extended crystal defects. The growth rate achieved under these conditions was approximately 0.05 mm/h. The nitrogen donor concentration in the grown 3C-SiC crystals was determined to be equal to (2–6)×10 18 cm −3.