Deep subwavelength topological edge state in a hyperbolic medium

Topological photonics offers the opportunity to control light propagation in a way that is robust from fabrication disorders and imperfections. However, experimental demonstrations have remained on the order of the vacuum wavelength. Theoretical proposals have shown topological edge states that can...

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Veröffentlicht in:Nature nanotechnology 2024-10, Vol.19 (10), p.1485-1490
Hauptverfasser: Orsini, Lorenzo, Herzig Sheinfux, Hanan, Li, Yandong, Lee, Seojoo, Andolina, Gian Marcello, Scarlatella, Orazio, Ceccanti, Matteo, Soundarapandian, Karuppasamy, Janzen, Eli, Edgar, James H., Shvets, Gennady, Koppens, Frank H. L.
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Sprache:eng
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Zusammenfassung:Topological photonics offers the opportunity to control light propagation in a way that is robust from fabrication disorders and imperfections. However, experimental demonstrations have remained on the order of the vacuum wavelength. Theoretical proposals have shown topological edge states that can propagate robustly while embracing deep subwavelength confinement that defies diffraction limits. Here we show the experimental proof of these deep subwavelength topological edge states by implementing periodic modulation of hyperbolic phonon polaritons within a van der Waals heterostructure composed of isotopically pure hexagonal boron nitride flakes on patterned gold films. The topological edge state is confined in a subdiffraction volume of 0.021 µm 3 , which is four orders of magnitude smaller than the free-space excitation wavelength volume used to probe the system, while maintaining the resonance quality factor above 100. This finding can be directly extended to and hybridized with other van der Waals materials to broadened operational frequency ranges, streamline integration of diverse polaritonic materials, and compatibility with electronic and excitonic systems. A photonic topological edge state, achieved by employing hexagonal boron nitride and patterned gold films, confines light four orders of magnitude below the diffraction limit while preserving a high quality factor.
ISSN:1748-3387
1748-3395
1748-3395
DOI:10.1038/s41565-024-01737-8