Photoinduced Phase Transitions of Imine-Based Liquid Crystal Dimers with Twist-Bend Nematic Phases
Photoisomerizable molecules in liquid crystals (LCs) allow for photoinduced phase transitions, facilitating applications in a wide variety of photoresponsive materials. In contrast to the widely investigated azobenzene structure, research on the photoinduced phase-transition behavior of imine-based...
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Veröffentlicht in: | Materials 2024-07, Vol.17 (13), p.3278 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Photoisomerizable molecules in liquid crystals (LCs) allow for photoinduced phase transitions, facilitating applications in a wide variety of photoresponsive materials. In contrast to the widely investigated azobenzene structure, research on the photoinduced phase-transition behavior of imine-based LCs is considerably limited. We herein report the thermal and photoinduced phase-transition behaviors of photoisomerizable imine-based LC dimers with twist-bend nematic (N
) phases. We synthesize two homologous series of ester- and thioether-linked
-(4-cyanobenzylidene)aniline-based bent-shaped LC dimers with an even number of carbon atoms (
= 2, 4, 6, 8, and 10) in the central alkylene spacers, namely, CBCOO
SBA(CN) and CBOCO
SBA(CN), possessing oppositely directed ester linkages, C=OO and OC=O, respectively. Their thermal phase-transition behavior is examined using polarizing optical microscopy and differential scanning calorimetry. All dimers form a monotropic N
phase below the temperature of the conventional nematic (N) phase upon cooling. Remarkably, the N
phases of CBCOO
SBA(CN) (
= 2, 4, 6, and 8) and CBOCO
SBA(CN) (
= 6 and 8) supercool to room temperature and vitrify without crystallization. In addition, the phase-transition temperatures and entropy changes of CBCOO
SBA(CN) are lower than those of CBOCO
SBA(CN) at the same
. Under UV light irradiation, the N
and N phases transition to the N and isotropic phases, respectively, and reversibly return to their initial LC phases when the UV light is turned off. |
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ISSN: | 1996-1944 1996-1944 |
DOI: | 10.3390/ma17133278 |