Surface characterization and microstructure of ITO thin films at different annealing temperatures
In this study, the electron beam evaporation method is used to generate an indium tin oxide (ITO) thin film on a glass substrate at room temperature. The surface characteristics of this ITO thin film are then investigated by means of an AFM (atomic force microscopy) method. The influence of postgrow...
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| Veröffentlicht in: | Applied surface science 2007-09, Vol.253 (23), p.9085-9090 |
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| container_issue | 23 |
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| container_title | Applied surface science |
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| creator | Raoufi, Davood Kiasatpour, Ahmad Fallah, Hamid Reza Rozatian, Amir Sayid Hassan |
| description | In this study, the electron beam evaporation method is used to generate an indium tin oxide (ITO) thin film on a glass substrate at room temperature. The surface characteristics of this ITO thin film are then investigated by means of an AFM (atomic force microscopy) method. The influence of postgrowth thermal annealing on the microstructure and surface morphology of ITO thin films are also examined. The results demonstrate that the film annealed at higher annealing temperature (300
°C) has higher surface roughness, which is due to the aggregation of the native grains into larger clusters upon annealing. The fractal analysis reveals that the value of fractal dimension
D
f falls within the range 2.16–2.20 depending upon the annealing temperatures and is calculated by the height–height correlation function. |
| doi_str_mv | 10.1016/j.apsusc.2007.05.032 |
| format | Article |
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°C) has higher surface roughness, which is due to the aggregation of the native grains into larger clusters upon annealing. The fractal analysis reveals that the value of fractal dimension
D
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°C) has higher surface roughness, which is due to the aggregation of the native grains into larger clusters upon annealing. The fractal analysis reveals that the value of fractal dimension
D
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The surface characteristics of this ITO thin film are then investigated by means of an AFM (atomic force microscopy) method. The influence of postgrowth thermal annealing on the microstructure and surface morphology of ITO thin films are also examined. The results demonstrate that the film annealed at higher annealing temperature (300
°C) has higher surface roughness, which is due to the aggregation of the native grains into larger clusters upon annealing. The fractal analysis reveals that the value of fractal dimension
D
f falls within the range 2.16–2.20 depending upon the annealing temperatures and is calculated by the height–height correlation function.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2007.05.032</doi><tpages>6</tpages></addata></record> |
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| identifier | ISSN: 0169-4332 |
| ispartof | Applied surface science, 2007-09, Vol.253 (23), p.9085-9090 |
| issn | 0169-4332 1873-5584 |
| language | eng |
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| source | ScienceDirect Journals (5 years ago - present) |
| subjects | Condensed matter: structure, mechanical and thermal properties Electron beam evaporation Exact sciences and technology Fractal analysis ITO thin film Morphology Physics Single-crystal and powder diffraction Structure and morphology thickness Structure of solids and liquids crystallography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thermal annealing Thin film structure and morphology X-ray diffraction and scattering |
| title | Surface characterization and microstructure of ITO thin films at different annealing temperatures |
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