ZnO nanocluster formation in SiO2 by low energy ion implantation

Variable size ZnO nanostructures embedded in silica substrates were obtained by low energy ion implantation. The samples obtained by both Zn implantation and Zn and O co-implantation sequences were subject to post annealing in inert and oxidizing atmospheres. The average size, distribution and optic...

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Veröffentlicht in:	Surface & coatings technology 2007-08, Vol.201 (19-20), p.8557-8559
Hauptverfasser:	MUNTELE, I, MUNTELE, C, THEVENARD, P, ILA, D
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Physics Surface treatments
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	Variable size ZnO nanostructures embedded in silica substrates were obtained by low energy ion implantation. The samples obtained by both Zn implantation and Zn and O co-implantation sequences were subject to post annealing in inert and oxidizing atmospheres. The average size, distribution and optical properties of the nanoclusters were obtained by optical spectroscopy measurements.
ISSN:	0257-8972 1879-3347
DOI:	10.1016/j.surfcoat.2006.01.086