Preparation of Ti-N-C black hard films by cylindrical cathode arc ion plating and medium frequency twin target unbalanced magnetron sputtering

Multi-layer Ti-N-C black hard films were deposited making use of cylindrical cathode arc ion plating and medium frequency twin target unbalanced magnetron sputtering. The morphologies and mechanical properties of the resulting hard films were investigated using a scanning electron microscope, spectrophotometer, and hardness meter. It was found that both the techniques could be well used to deposit deep black Ti-N-C hard films. The deposition efficiency of the cylindrical cathode arc ion plating was higher than that of the medium frequency twin target unbalanced magnetron sputtering, and the Ti-N-C hard film prepared using the former technique had better mechanical properties. At the same time, the black hard film deposited by medium frequency twin target unbalanced magnetron sputtering was smoother and more black as compared to the film deposited by cylindrical cathode arc ion plating.