Transparent and conducting ZnO films prepared by reactive pulsed laser deposition

Undoped ZnO films were prepared on glass substrates without any post-deposition heat treatment using a pulsed Nd:YAG laser ablation of Zn target in the presence of oxygen as reactive atmosphere. Structural, optical, and electrical properties of these films have been investigated as functions of oxyg...

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Veröffentlicht in:	Journal of materials science. Materials in electronics 2007-04, Vol.18 (4), p.397-400
Hauptverfasser:	ISMAIL, Raid A, RASHEED, Bassam G, SALM, Evan T, AL-HADETHY, Mukram
Format:	Artikel
Sprache:	eng
Schlagworte:	Acoustic wave devices, piezoelectric and piezoresistive devices Applied sciences Conduction Deposition Electrical properties Electrical resistivity Electronics Exact sciences and technology Glass substrates Lasers Microelectronic fabrication (materials and surfaces technology) Opacity Optical properties Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Zinc oxide
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Zusammenfassung:	Undoped ZnO films were prepared on glass substrates without any post-deposition heat treatment using a pulsed Nd:YAG laser ablation of Zn target in the presence of oxygen as reactive atmosphere. Structural, optical, and electrical properties of these films have been investigated as functions of oxygen pressure during deposition. Transparent conducting ZnO films, formed at 120 torr of oxygen pressure, showed an electrical resistivity of 0.27 ohmcm, a mean optical transmittance of 80%, and an optical band gap of 3.25 eV.[PUBLICATION ABSTRACT]
ISSN:	0957-4522 1573-482X
DOI:	10.1007/s10854-006-9046-y