The structural evolution and electrochemical properties of the textured Cu2O thin films

The (200) and (111) preferred Cu2O thin films are prepared by electrochemical deposition from copper-lactate system. The texture of the films could be modified by simply changing the bath pH or overpotential. The detailed microstructure and its evolution are also observed by both scanning electron microscopy and transmission electron microscopy. It is found that the growth of the (200) preferred films is achieved by the columnar growth with a coalescence mechanism, but that of the (111) preferred films is the growth involving a secondary nucleation and growth. It is also found that the (200) textured films exhibit better electrochemical property toward Li than the (111) textured ones due to the different microstructure features originating from different growth behavior.