NUMERICAL SIMULATION APPLIED TO CHEMICAL VAPOUR DEPOSITION PROCESS. RAPID THERMAL CVD AND SPRAY CVD

NUMERICAL SIMULATION APPLIED TO CHEMICAL VAPOUR DEPOSITION PROCESS. RAPID THERMAL CVD AND SPRAY CVD

The paper gives an overview of the different applications of the numerical simulation in chemical vapour deposition (CVD) process and equipment. In particular, emphasis will be given to the modelling of Rapid Thermal Low Pressure CVD and to the perspective of modelling Spray CVD.

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Veröffentlicht in:Journal of Optoelectronics and Advanced Materials 2005-04, Vol.7 (2), p.599-606
1. Verfasser: Bouteville, A
Format: Artikel
Sprache:eng
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Zusammenfassung:The paper gives an overview of the different applications of the numerical simulation in chemical vapour deposition (CVD) process and equipment. In particular, emphasis will be given to the modelling of Rapid Thermal Low Pressure CVD and to the perspective of modelling Spray CVD.
ISSN:1454-4164