LASER AND ELECTRON INDUCED STRUCTURING OF THIN FILMS ON THE BASE OF CARBAZOLYL-CONTAINING POLYMERS AND POLYMER-ChNS COMPOSITIONS

With the purpose of extension of the class of polymer materials and nano-composites polymer-chalcogenide non-crystalline semiconductors (ChNS) for photo-and electron-beam lithography thin films from carbazolyl containing copolymers and nano-composites have been prepared, tested and investigated. Electron-beam and holography recording was processed in the CAM:OMA and CEM:MMA thin films. In conditions of different radiation the optical and sensitometric characteristics (absorption, reflection etc) in dependence on the concentration of CHI3 in a photopolymer thin films and on their thickness have been investigated. The polymer composition films based on different photopolymer PEPC, PVA, BMA containing additive of amorphous semiconductor As2S3, S, Se, GeSe have been received. For all compositions the transmission spectra have been studied in dependence on the concentration of each , component of nano-composite. The influence of additional illumination on optical properties of mentioned samples has been studied taking into account their possibilities for application in the systems of optical holographic recording in visible and infrared ranges of spectrum.