AFM AND SEM INVESTIGATIONS OF ION BEAM SYNTHESIZED Mg2Si PRECIPITATES IN Si SUBSTRATES

The Mg2Si phase was fabricated using ion beam synthesis with high doses of 24Mg+ implantation in Si substrates, followed by rapid thermal annealing. The chemical composition of the as-implanted and of samples annealed under different conditions was studied by X-ray energy dispersive spectroscopy. Th...

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Veröffentlicht in:Journal of Optoelectronics and Advanced Materials 2005-02, Vol.7 (1), p.369-372
Hauptverfasser: Angelov, Ch, Mikli, V, Amov, B, Goranova, E
Format: Artikel
Sprache:eng
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Zusammenfassung:The Mg2Si phase was fabricated using ion beam synthesis with high doses of 24Mg+ implantation in Si substrates, followed by rapid thermal annealing. The chemical composition of the as-implanted and of samples annealed under different conditions was studied by X-ray energy dispersive spectroscopy. The effect of the different doses and annealing time on the surface morphology was investigated by scanning electron microscopy and atomic force microscopy.
ISSN:1454-4164