AFM AND SEM INVESTIGATIONS OF ION BEAM SYNTHESIZED Mg2Si PRECIPITATES IN Si SUBSTRATES
The Mg2Si phase was fabricated using ion beam synthesis with high doses of 24Mg+ implantation in Si substrates, followed by rapid thermal annealing. The chemical composition of the as-implanted and of samples annealed under different conditions was studied by X-ray energy dispersive spectroscopy. Th...
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Veröffentlicht in: | Journal of Optoelectronics and Advanced Materials 2005-02, Vol.7 (1), p.369-372 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | The Mg2Si phase was fabricated using ion beam synthesis with high doses of 24Mg+ implantation in Si substrates, followed by rapid thermal annealing. The chemical composition of the as-implanted and of samples annealed under different conditions was studied by X-ray energy dispersive spectroscopy. The effect of the different doses and annealing time on the surface morphology was investigated by scanning electron microscopy and atomic force microscopy. |
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ISSN: | 1454-4164 |