Plasma Deposition of Thiophene Derivatives Under Atmospheric Pressure

Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives (thiophene, 3‐methylthiophene, and 3,4‐ethylenedioxythiophene) are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as...

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Veröffentlicht in:Chemical vapor deposition 2006-12, Vol.12 (12), p.719-727
Hauptverfasser: Dams, R., Vangeneugden, D., Vanderzande, D.
Format: Artikel
Sprache:eng
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Zusammenfassung:Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives (thiophene, 3‐methylthiophene, and 3,4‐ethylenedioxythiophene) are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as X‐ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, UV‐vis spectroscopy, and resistance measurements. Good results are obtained with pulsed plasma depositions of poly(3,4‐ethylenedioxythiophene). Conductivities of up to 1 × 10—2 S cm–1 are measured. Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as X‐ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, UV‐vis spectroscopy, and resistance measurements. Good results are obtained with pulsed plasma depositions of poly(3,4‐ethylenedioxythiophene). Conductivities of up to 1 × 10–2 S cm–1 are measured.
ISSN:0948-1907
1521-3862
DOI:10.1002/cvde.200606483