Fine-tuning of GaAs photonic crystal cavities by digital etching

Optical cavities with quality factors above 2 × 10 5 were realized based on photonic crystal heterostructures in a GaAs membrane. The growth of natural oxide on these structures was investigated by monitoring the resonance wavelength of the cavity over time. A logarithmic time dependence of the oxid...

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Veröffentlicht in:Microelectronic engineering 2007-05, Vol.84 (5), p.1405-1407
Hauptverfasser: Sünner, T., Herrmann, R., Löffler, A., Kamp, M., Forchel, A.
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Sprache:eng
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Zusammenfassung:Optical cavities with quality factors above 2 × 10 5 were realized based on photonic crystal heterostructures in a GaAs membrane. The growth of natural oxide on these structures was investigated by monitoring the resonance wavelength of the cavity over time. A logarithmic time dependence of the oxide thickness was found. Combining surface oxidation over a defined time interval and subsequent oxide removal using a wet chemical treatment, tuning of the resonance wavelength in steps of less than 2 nm was achieved.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2007.01.064