Creating spin currents with a ferromagnetically-gated silicon inversion layer
Novel spin transport behavior is shown to result from replacing the metal gate with a ferromagnet in a silicon field-effect transistor. The coupling of inversion-layer electrons to the ferromagnetic gate results in spin-dependent transport in the device; an ultra-thin gate oxide is required to optim...
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Veröffentlicht in: | Bulletin of the American Physical Society 2004-03, Vol.49 (1), p.J26 8-J26 8 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Novel spin transport behavior is shown to result from replacing the metal gate with a ferromagnet in a silicon field-effect transistor. The coupling of inversion-layer electrons to the ferromagnetic gate results in spin-dependent transport in the device; an ultra-thin gate oxide is required to optimize the effect. The interplay between the drift current (due to a source-drain bias) and the diffusion current (due to electron leakage into the biased gate) allows for a rich variety of spin-dependence in the current that flows through such a device. In the regime of low source-drain bias, both 100 percent spin-polarized electrical currents and pure spin currents are possible. |
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ISSN: | 0003-0503 |