Creating spin currents with a ferromagnetically-gated silicon inversion layer

Novel spin transport behavior is shown to result from replacing the metal gate with a ferromagnet in a silicon field-effect transistor. The coupling of inversion-layer electrons to the ferromagnetic gate results in spin-dependent transport in the device; an ultra-thin gate oxide is required to optim...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Bulletin of the American Physical Society 2004-03, Vol.49 (1), p.J26 8-J26 8
Hauptverfasser: McGuire, J P, Ciuti, C, Sham, L J
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Novel spin transport behavior is shown to result from replacing the metal gate with a ferromagnet in a silicon field-effect transistor. The coupling of inversion-layer electrons to the ferromagnetic gate results in spin-dependent transport in the device; an ultra-thin gate oxide is required to optimize the effect. The interplay between the drift current (due to a source-drain bias) and the diffusion current (due to electron leakage into the biased gate) allows for a rich variety of spin-dependence in the current that flows through such a device. In the regime of low source-drain bias, both 100 percent spin-polarized electrical currents and pure spin currents are possible.
ISSN:0003-0503