EUV sources using Xe and Sn discharge plasmas

This paper reports the basic results that have been obtained at the SRC RF TRINITI (the former Branch of the Kurchatov Institute of Atomic Energy). The work deals with the development of high power discharge produced plasma EUV sources that can meet the requirements of high volume manufacturing lithography tools. Solving the problem of extremely high thermal loads on the electrodes of a EUV source by moving away the electrode surfaces from the plasma and using both multi-discharge systems and rotating Sn-covered disc electrodes is discussed.