Structural stability of decorative ZrNxOy thin films

Structural stability of decorative ZrNxOy thin films

ZrNxOy thin films were prepared by rf reactive magnetron sputtering. The thermal stability of the coatings was tested in vacuum for an annealing time of 1 h in the temperature range 400–800 °C. Residual stresses originated by the deposition process were partially or almost completely released with t...

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Veröffentlicht in:Surface & coatings technology 2005-10, Vol.200 (1-4), p.748-752
Hauptverfasser: Carvalho, P., Vaz, F., Rebouta, L., Carvalho, S., Cunha, L., Goudeau, Ph, Rivière, J.P., Alves, E., Cavaleiro, A.
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Metals. Metallurgy
Other topics in materials science
Physics
Production techniques
Sputtering
Surface treatment
Thermal degradation
Zirconium nitride
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Zusammenfassung:ZrNxOy thin films were prepared by rf reactive magnetron sputtering. The thermal stability of the coatings was tested in vacuum for an annealing time of 1 h in the temperature range 400–800 °C. Residual stresses originated by the deposition process were partially or almost completely released with the annealing, which is consistent with the X-ray diffraction results. Samples with low oxygen fraction (0.10
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2005.02.100