Ruthenium Films Deposited by Liquid-Delivery MOCVD Using Bis(ethylcyclopentadienyl)ruthenium with Toluene as the Solvent

Pure ruthenium thin films are prepared by liquid‐delivery metal‐organic (MO)CVD using bis(ethylcyclopentadienyl)ruthenium (Ru(EtCp)2) with toluene as the solvent. The deposition of Ru thin films is carried out on various substrates at temperatures in the range 330–460 °C via the oxygen‐assisted pyro...

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Veröffentlicht in:	Chemical vapor deposition 2006-07, Vol.12 (7), p.429-434
Hauptverfasser:	Hur'yeva, T., Lisker, M., Burte, E. P.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Mechanical and acoustical properties of condensed matter Metal-organic CVD Methods of deposition of films and coatings film growth and epitaxy Physics Ruthenium Soluble precursors
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