Micropatterned Porous-Silicon Bragg Mirrors by Dry-Removal Soft Lithography

Micropatterned Porous-Silicon Bragg Mirrors by Dry-Removal Soft Lithography

Micropatterned porous‐Si Bragg mirrors (see figure) are created by dry‐removal soft lithography. This lift‐off technique utilizes a patterned polymer stamp to remove porous‐Si layers from the Si substrate. The nanostructure and optical properties of the porous‐Si photonic crystal are conserved throu...

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Veröffentlicht in:Advanced materials (Weinheim) 2006-12, Vol.18 (23), p.3164-3168
Hauptverfasser: Gargas, D. J., Muresan, O., Sirbuly, D. J., Buratto, S. K.
Format: Artikel
Sprache:eng
Schlagworte:
Bragg mirrors
Nanostructured materials
porous
Porous materials
Sensors
Silicon
Silicon, porous
Soft lithography
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Zusammenfassung:Micropatterned porous‐Si Bragg mirrors (see figure) are created by dry‐removal soft lithography. This lift‐off technique utilizes a patterned polymer stamp to remove porous‐Si layers from the Si substrate. The nanostructure and optical properties of the porous‐Si photonic crystal are conserved throughout the micropatterning process. In addition, reversible chemical sensing via optical reflectivity is demonstrated with a porous‐Si Bragg mirror.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200601354