Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator

A proof-of-concept multi beam blanking device (“blanking demonstrator”) has been fabricated for the projection mask-less lithography project. It comprises a Si chip with approx. 4000 openings (each has a size of 8 × 8 μm 2) etched through with adjacent blanking electrodes fabricated by electroplating. The parameters of the blanking demonstrator such as electrode layout and density of openings are identical to the blanking device of the final production tool. The demonstrator is being tested within a dedicated broad beam electron beam teststand, which has proven to resolve